Rita Mullins Wins Best Poster Presentation at the 19th International Conference on Atomic Layer Deposition

26 Jul 2019

School of Chemistry PhD student Rita Mullins won a 'Best Poster Presentation' prize at the AVS 19th International Conference on Atomic Layer Deposition (ALD 2019).

ALD 2019 took place this week, July 21-24, in Bellevue, Washington, USA. ALD 2019, featuring the 6th International Atomic Layer Etching Workshop (ALE 2019), is a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.

Rita, a B.Sc. Chemical Physics graduate, carries out her PhD research in the Tyndall National Institute under the supervision of Dr. Michael Nolan. Her winning poster at ALD 2019 was entitled "A Mechanistic Study of the HF Pulse in the Thermal Atomic Layer Etch of HfO2 and ZrO2".